- All sections
- C - Chemistry; metallurgy
- C23F - Non-mechanical removal of metallic material from surfaces; inhibiting corrosion of metallic material; inhibiting incrustation in general; multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 4/00 - Processes for removing metallic material from surfaces, not provided for in group or
Patent holdings for IPC class C23F 4/00
Total number of patents in this class: 341
10-year publication summary
50
|
44
|
30
|
38
|
40
|
25
|
19
|
16
|
10
|
1
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Tokyo Electron Limited | 11599 |
34 |
Lam Research Corporation | 4775 |
19 |
Applied Materials, Inc. | 16587 |
18 |
Hitachi High-Tech Corporation | 4424 |
10 |
Hon Hai Precision Industry Co., Ltd. | 4157 |
8 |
Tsinghua University | 5426 |
8 |
Canon Anelva Corporation | 676 |
8 |
Tessera LLC | 246 |
8 |
Varian Semiconductor Equipment Associates, Inc. | 1282 |
7 |
Techinsights Inc. | 92 |
7 |
Samsung Display Co., Ltd. | 30585 |
5 |
Seagate Technology LLC | 4228 |
5 |
Japan Aviation Electronics Industry, Limited | 1585 |
5 |
Toyo Kohan Co., Ltd. | 413 |
5 |
FUJIFILM Corporation | 27102 |
4 |
Boe Technology Group Co., Ltd. | 35384 |
4 |
Central Glass Company, Limited | 1244 |
4 |
Tohoku University | 2526 |
4 |
Samsung Electronics Co., Ltd. | 131630 |
3 |
LG Chem, Ltd. | 17205 |
3 |
Other owners | 172 |